In-situ Metrology for Semiconductor Manufacturing
Resistant to corrosive gases
Fast sampling, high sensitivity
Real-time actionable results
OVERVIEW
Fast, High Sensitivity Mass Spectrometers for in-situ Metrology
The ASTON platform includes a portfolio of fast, high-sensitivity mass spectrometers with proprietary software that enable quantitative, rapid gas analysis required in complex in-situ semiconductor manufacturing processes. The ASTON platform delivers real-time, chemically specific actionable insights to maximize throughput and yield. One tool can replace multiple legacy tools.
Best-in-Class Features
Parts per billion (PPB) sensitivity
Fast sample rate with High Sensitivity
Stability
Repeatability
Long sensor lifetime
Broad mass range
ASTON Advantages
Ideal for ALD/ALE and Safety
Resistant to corrosive gases and condensates
Real-time data, actionable insights
Cloud connected
No plasma required
One Tool, Many Solutions
The ASTON Platform supports the broad metrology needs, including the precise in-situ process management required in today’s industry.
Aston is up to 20x more sensitive in detecting end point in high-speed sampling applications. This is especially important when measuring low concentration byproduct gases, where signal to noise ratio is critical to informing process decisions.
The ASTON Platform solves the key in-situ metrology issues
- Corrosive gases damage sensor
ASTON is resistant to HCl and HF as process byproducts, NF3 for chamber cleans - Condensate particles coat sensor
ASTON is resistant to TEOS & Silane byproducts used for Silicon Nitride & Oxide Deposition - Speed and sensitivity
ASTON delivers best-in-class, high-speed measurements combined with PPB level sensitivity for process control
Engineered from the ground up for in-situ semiconductor metrology applications.
Dielectric Etch Endpoint
Small Open Area Dielectric Etch Endpoint (<1%)
ALD Endpoint
Metal Etch Endpoint
Chamber Management and Safety
Built specifically for semi applications
Optical Emission Spectroscopy (OES)
- Inadequate sensitivity
- Not quantitative
Residual Gas Analysis (RGA)
- Inadequate sensitivity
- Slow sampling speeds
- Lacks robustness
Built specifically for semi applications
Dielectric Etch Endpoint
Small Open Area Dielectric Etch Endpoint
Metal EtchEndpoint
ALD Endpoint
Chamber Management and Safety
Optical Emission Spectroscopy (OES)
- Inadequate sensitivity
- Not quantitative
Dielectric Etch Endpoint
Small Open Area Dielectric Etch Endpoint
Metal EtchEndpoint
ALD Endpoint
Chamber Management and Safety
Residual Gas Analysis (RGA)
- Inadequate sensitivity
- Slow sampling speeds
- Lacks robustness
Dielectric Etch Endpoint
Small Open Area Dielectric Etch Endpoint
Metal EtchEndpoint
ALD Endpoint
Chamber Management and Safety
Watch the Latest Webinar
A New Spin on Spatial ALD Metrology Solutions
What You'll Learn
- Spatial ALD advantages and challenges
- Why speed with sensitivity and robustness matter in Spatial ALD metrology solutions
- Aston Impact and Plasma metrology solutions and differentiation that is leading them to be used as a key in-situ process control metrology in spatial ALD applications