Vacuum pumps are typically reliable products, but when used in harsh semiconductor manufacturing processes, they can fail unexpectedly, causing downtime and damage to wafers.

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Predicting such failures requires access to reliable real-time data. The in-situ measurement and control required to prevent this wafer loss is extremely challenging. Effective process control requires real-time measurements with high sensitivity and repeatability, but many process and chamber cleaning gases are corrosive, and CVD deposition masks everything with condensed particles. Legacy measurement solutions such as residual gas analysis are known to be susceptible to corrosive gases and can easily be corroded after only a few hours of operation.

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That's where Aston, Atonarp's measurement platform, provides real-time, actionable information that supports data-driven predictive pump failure modeling, measuring gases entering and leaving dry pumps and enabling predictive modeling of destructive corrosion and deposit buildup. power. Aston is also resistant to corrosive gases and robust enough to be a true in-situ measurement solution.

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To learn more, download the application brief to see how Aston achieves preventive maintenance of pumps in semiconductor manufacturing.