However, atomic-scale processes and their new chemistry (ALD and ALE) require new approaches to in-situ instrumentation, process control, and chamber management.

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Atonarp will describe a practical approach to these application challenges (through real-world examples of customer evaluations) and the unique capabilities of the Aston product line that enable actionable insights to solve these problems.

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What you will learn

Why are these semiconductor applications and process chamber needs emerging now, and what has changed?
Problem statement in applications that require a new approach to in-situ process metrology and chamber management
What is the solution and what is the value to the client?
What is different about the Atonarp Aston platform solution for semiconductors?
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Click here to read the white paper "Not All Greenhouse Gases Are Created Equal."