ASTON now features a newly developed gas delivery system. This system allows anyone to easily achieve gas line temperature control, gas conductance control over a wide pressure range, and unrivaled real-time performance.
It dramatically improves measurement accuracy and efficiency in semiconductor manufacturing processes by enabling high-precision, stable control over gas introduction—a process that previously required expert skill.
Master complex gas flows and bring new possibilities and efficiency to your R&D and manufacturing sites.

This shows ASTON monitoring Ar, N2, and O2 being switched every 30 seconds while maintaining a constant pressure in the test chamber. In the pre-optimization results, gas stagnation and diffusion occur within the gas lines, preventing the expected response. In the post-optimization results, the signals for each gas show the expected response.