Atonarp has announced Aston, an innovative in-situ semiconductor metrology platform with an integrated plasma ionisation source.
It is a major evolution in metrology for semiconductor production processes, facilitating in-situ molecular process control and enabling existing fabs to run more efficiently, pushing higher output. Developed from the ground up for semiconductor production, it is a robust platform that can supplant multiple legacy tools and offer unprecedented levels of control over a complete set of applications, including lithography, dielectric and conductive etch and deposition, chamber matching, chamber clean, and abatement.