Semiconductor Digest editor-in-chief Pete Singer recently interviewed Joe Cestari, Atonarp's GM mass spectrometry.
In the video, Joe explains the advantages of Atonarp’s Aston mini-mass spectrometers over traditional methods of in-situ chamber analysis, such as optical emission spectroscopy (OES) and residual gas analysis (RGA).
Aston enables real time in-situ monitoring of precursors, reactants, and by-products during various process steps, which allows for baseline fingerprinting, chamber clean and process monitoring end point.
The Aston unit features a rugged plasma ionization source and a self-cleaning ReGen mode.
Watch the Interview