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TOPSolutionSemiconductor Etching Process
Semiconductor Etching Process

Semiconductor Etching Process

Pinpointing the etching "endpoint" at the atomic level.

In nanoscale microfabrication, the success or failure of the etching process directly impacts product performance. ASTON analyzes the complex, dynamic state of the plasma in real-time at the molecular level, enabling data-driven precision process control that does not rely on time or empirical rules.

Pinpointing the etching "endpoint" at the atomic level.

  1. 1. Accurate Endpoint Detection

    It captures subtle changes in specific substances generated during etching, detecting the boundaries of stacked films with atomic-level precision. This eradicates over-etching and under-etching, achieving ideal fabrication.

  2. 2. Real-time Monitoring of Process Stability

    It constantly monitors plasma chemical reactions, "visualizing" process stability. This enhances recipe reproducibility and thoroughly suppresses quality variations between products.

  3. 3. Early Anomaly Detection and Proactive Trouble Prevention

    It instantly detects signs of anomalies that affect the process, such as gas flow irregularities or chamber contamination. Issues are resolved before they lead to critical defects or equipment downtime.

"Complete process visualization" achieves both shorter development times for next-generation semiconductors and high yields in mass production, establishing your technological advantage.

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